<sup>72</sup>Ge in the form of Germanium Tetrafluoride Gas GeF4

72Ge in the form of Germanium Tetrafluoride Gas GeF4

Germanium isotopes

Enriched Germanium Tetrafluoride gas is used as preamorphic implant to prevent silicon wafer from implant dopant channeling. Furthermore, it is used to strain silicon wafer which optimizes the performance and speed of the device.

Specifications

Isotopic Abundance:

Item   70Ge 72Ge 73Ge 74Ge 76Ge
Abundance (%) GC-MS
(±0.5)		 8.78 65.02 12.81 13.37 0.02

RGA Analysis

Component Analysis Specification Detect Limit Units Analysis Method
GeF4 Purity ≥99.99 / % by Volume GC-MS
72Ge ≥55% 0.0001 AT% GC-MS
O2 ≤25 0.1 ppmv GC-MS
N2 ≤25 0.1 ppmv GC-MS
CO2 ≤25 0.1 ppmv GC-MS
SO2 ≤25 0.1 ppmv GC-MS
HF ≤25 0.1 ppmv GC-MS
Ar ≤25 0.1 ppmv GC-MS
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